Macro surface inspection system

  • Product No:Stealth
  • Manufacturer:TOHO Electronics Inc.

Accurately and quickly check the entire substrate

Model Stealth300V uses a linear LED light source to irradiate the substrate/film surface and an ultra-high-sensitivity camera to scan the positive and negative/scattered light from the sample. The machine capture the entire image and detect the defects on the surface through image analysis.

Compared to previous local inspection equipment, Stealth can detect various surface defects more quickly and comprehensively. This machine is suitable for quality inspection of various films after various process stages, such as exposure MURA, photoresist, PI film, residue MURA, etc.. In addition, the machine can measure the height of the Micro Lens and LED PSS. 

Test object

  • Photoresist MURA

  • Print residual film MURA

  • LED PSS height MURA

  • Color Filter MURA, etc.


  • Wafer size: 2-12” Wafer

  • Camera: Linear Sensor Camera

  • Light source: LED

  • Inspection method: Detection with two methods: reflection/scattering

  • Measurement time: 1 sample /1 minute (excluding image analysis time)

  • Red, blue, and white light can be used

  • Supports SEMI 150-300mm wafers, FPD G10.5 or less, or LED 50-150mm chips

  • The smallest detectable particle size 28um