The Vertex Marathon™ is the newest generation in the Vertex family. It is designed for high volume manufacturing. Marathon processes 200mm and 300mm substrates with unique process capabilities and patented applications for a variety of metals and ITO.
• EFEM contains FOUPS and Robot with End-effector
• 50 WPH for entire stack
• Easy handling and loading of substrates
• Accurate and repeatable positioning of substrate deposition
• Multilayer deposition in various material stack options without the need to break the vacuum
• Inductively Coupled Plasma (ICP)
• Linear Pulsed DC Magnetron Sputter
• Cylindrical Rotating Pulsed DC Magnetron Sputter
(CMAG)
• Linear Scanning Magnet Array (LSMA)