The Vertex Marathon™ is the newest generation in the Vertex family. It is designed for high volume manufacturing. Marathon processes 200mm and 300mm substrates with unique process capabilities and patented applications for a variety of metals and ITO.
· Easy handling and loading of substrates
· Optional EFEM contains FOUPS and Robot with End-effector
· Accurate and repeatable positioning of substrate deposition
· Multilayer deposition in various material stack options without the need to break the vacuum
· Inductively Coupled Plasma (ICP)
· Cylindrical Rotating Pulsed DC Magnetron Sputter (CMAG)
· High throughput and low Cost of Ownership (COO)
